Thermo Scientific™ etraethyl orthosilicate (TEOS) ≥99%

Tetraethoxysilane (TEOS), also known as tetraethyl orthosilicate, is a high-purity organosilicon compound widely used as a precursor to silicon dioxide (SiO₂) in materials science and nanotechnology. With a purity of ≥99.0%, Thermo Scientific™ TEOS is suitable for demanding applications in the semiconductor industry, zeolite synthesis, sol-gel processes, and aerogel fabrication.

In addition to its use as a silica source, TEOS acts as a crosslinking agent in the production of silicone polymers, and as a binder or adhesion promoter in coatings, adhesives, and sealants. Its controlled hydrolysis and polymerization behavior make it a versatile compound in research and industrial settings.

Key Features & Benefits

• High Purity (≥99%)
  Ensures reproducibility in sensitive synthesis and deposition processes.
• Excellent Precursor for SiO₂ Synthesis
  Standard material for sol-gel, zeolite, and aerogel production.
• Versatile Crosslinker
  Used to form siloxane bonds in silicone rubber and polymer matrices.
• Soluble & Reactive
  Easily hydrolyzed under acidic or basic conditions to form silica networks.
• Industrial & Research Applications
  Applicable in optical coatings, semiconductors, and inorganic nanomaterials.

Technical Specifications

Applications & Use Cases

• Sol-Gel Chemistry
  • Precursor for silica networks and porous structures
  • Used in aerogels, xerogels, and optical films
• Zeolite Synthesis
  • Source of silicon in templated crystallization processes
• Semiconductor Fabrication
  • Forms dielectric SiO₂ layers via chemical vapor deposition (CVD)
• Silicone Polymer Crosslinking
  • Used as a silane crosslinker in RTV (room-temperature vulcanized) systems
• Coatings and Adhesives
  • Enhances adhesion and chemical resistance in hybrid materials

Thermo Scientific™ Tetraethoxysilane (TEOS), 99+% is a high-quality, reactive silicon alkoxide ideal for use in nanomaterials synthesis, semiconductor processing, and advanced polymer systems. Its consistent purity and reactive profile make it the preferred silica precursor for research and industrial labs seeking reliable performance and reproducible results in sol-gel and thin-film applications.